WebJan 15, 2024 · The PAS-29 COTI is 320×240 pixel 8-12μ wavelength, whereas the Jerry-C is 640×512, 12 μm pixel sensor with 50Hz resolution. Operational range: 1100m man-sized target, 270m recognition, 140m identification. One of the biggest differences you will notice right away is the 30.5º FOV versus the 20º FOV of the PAS-29 COTI. WebLow-resistivity polycrystalline cobalt disilicide (CoSi 2) has many favorable properties, such as low bulk electrical resistivity and good lattice match with Si (001), and has been widely used as a contact material for …
Advanced Anneal Solutions for Silicides - American …
Webtitanium silicide (TiSiz) and cobalt suicide (CoSi2), are widely used in advanced CMOS technologies. However, only CoSi2 salicide process is scalable to deep sub-micron technology, since the resistivity of CoSi2 phase is independent of the dimensions. CoSi2 salicide process using titanium nitride (TiN) as capping film has been developed. WebThe effects of cap layer type (Ti or TiN) and its thickness, Co thickness and rapid thermal processing (RTP) temperature on cobalt silicide formation are investigated by a combination of electrical and optical measurements. … sharona attarchi
Metal Silicides: An Integral Part of Microelectronics
WebLow-resistivity polycrystalline cobalt disilicide (CoSi 2) has many favorable properties, such as low bulk electrical resistivity and good lattice match with Si (001), and has been widely used as a contact material for silicon ULSI … WebJan 1, 2000 · Due to its low resistivity, CoSi 2 is a possible alternative to TiSi 2. The main problem for the use of CoSi 2 is the sensitivity of the silicide formation for oxygen [2], [3]. Oxygen may delay or even inhibit silicide formation. Other technologically important silicides, like PtSi and NiSi, suffer from this same problem [1]. WebSep 1, 1989 · TiSi2 has been the main component in self-aligned silicide processes and recently the properties of CoSi 2, such as reduced selective formation process and smoothness have rendered it also attractive for VLSI technology [1,2]. sharona alperin and doug fieger